Chemical vapor deposition (CVD) is a chemical process used to produce high-purity, high-performance solid materials. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon, carbon fiber, carbon nanofibers, filaments, carbon nanotubes, silicon oxide, titanium oxide, titanium nitride, aluminium oxide, silicon carbide and various high-k dielectrics. The chemical vapour deposition process is also used to produce synthetic diamonds. At Limedion we deposit a wide range of coatings with the CVD method resulting in high quality, dense and good adhering layers. Especially optical coatings are well accessible with the CVD method.