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PVD and IBAD

Deposition by e-beam-evaporation

Deposition by e-beam-evaporation
Heating up and evaporating metals, alloys, ceramics and compounds and condensing the emerging vapour at a nearby target is the basic PVD method. At Limedion we can run up to 3 crucibles simultaneously, which allows us to alloy a wide variety of compounds in almost all possible compositions. Typical thicknesses can vary from few nm for optical applications to few µm for corrosion protective coatings. The film thickness is monitored with the oscillating crystal method.

 

Reactive vapour deposition

Additionally to the deposition method used, reactive gas is feeded to the substrate. During the condensation process the vapour reacts with gas and surface to form compounds, typically oxides, nitrides and carbides. Examples are TiN, Al2O3, WC, etc. With advanced process gas control it is also possible to gain e.g. metal/metal nitride/metal structures or other even more complex systems.

Ion beam assisted deposition (IBAD)

The IBAD process is basically a PVD process enhanced by an ion gun. The ion guns are run with inert gases or reactive gases (reactive IBAD). The ion energy is a well controllable parameter which allows to fine dose the amount of energy deposited in the film growth area. By matching the ion current density to the evaporation rate it is possible to create variable stoichometries in the growing film. IBAD coatings are normally very dense and show improved adhesion. Important film properties like hardness, friction, intrinsic stress etc. can be influenced by varying the ion beam parameters. The deposition of energy takes place exactly where it is needed – in the growth zone, whereas the main body of the substrate stays almost cold. This predestines the method for coatings which need energy to gain proper growth, but where the substrate is sensitive against heat, like with polymers.